The MKS RPS AX7695 Integrated Remote Plasma Source is a device used in semiconductor wafer processing to generate a clean and low-cost source of atomic radicals. It is a self-contained unit that integrates a quartz vacuum chamber, RF power supply, and all necessary controls, making it easy to install directly on the tool process chamber.

The AX7695 can deliver up to 6 kW of plasma power and high flows of radicals (up to 6 slm) to the process, resulting in strip or etch rates that are twice as fast as those of conventional microwave systems. It is also a very clean source of radicals, which is important for semiconductor manufacturing.

Here are some of the key features of the MKS RPS AX7695 Integrated Remote Plasma Source:

• ·Delivers up to 6 kW of plasma power
• ·High flow rates of radicals (up to 6 slm)
• ·Clean source of radicals
• ·Easy to install
• ·Compact and self-contained

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