Lam Research 853-A50744-001 Measurement Module

Short Description:

853-A50744-001 is a critical Radio Frequency (RF) sensing and measurement component designed by Lam Research for its advanced plasma processing systems.

FOB Price: US $0.5 - 9,999 / Piece

Min.Order Quantity: 100 Piece/Pieces

Supply Ability: 10000 Piece/Pieces per Month

Brand: Lam Research

Manager: Jinny

E-mail: sales5@xrjdcs.com

Tel: + 86-18250705533

( WhatsApp )Wechat: + 86-18250705533

Warranty: one year

In stock: In stock

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Product Detail

Product Tags

Lam Research 853-A50744-001

Product Overview

853-A50744-001 is a critical Radio Frequency (RF) sensing and measurement component designed by Lam Research for its advanced plasma processing systems. Specifically, it functions as a high-precision RF Voltage/Current (V/I) probe and RF Phase/Power detector. The prefix “853″ of the model clearly identifies it as an RF sensing and detection device, holding a pivotal position in Lam Research’s spare parts system.

Installed in series on the transmission line between the RF generator and the process chamber, 853-A50744-001 accurately captures real-time amplitude data of RF voltage and current, as well as the phase difference between the two signals. Its internal circuitry converts these high-frequency analog signals into DC level signals that can be directly read by the host machine’s main control systems (e.g., APC and PMC).

These core measurement data serve as the fundamental basis for calculating forward power, reflected power, load impedance and plasma status, enabling closed-loop impedance matching and precise process parameter control in semiconductor manufacturing.

Minor fluctuations in plasma state will directly affect the etching rate and Critical Dimension (CD) of wafers. Therefore, the high-fidelity measurement data provided by 853-A50744-001 is essential for stabilizing process performance and ensuring high yield in mass production. Adopting this original certified component is a strategic choice to guarantee equipment measurement accuracy and avoid process deviation caused by sensing distortion.

Product Specifications

Parameter Name	Parameter Value
Product Model	853-A50744-001
Manufacturer	Lam Research
Product Type	RF Voltage/Current (V/I) Sensor / Phase Detector
Applicable Systems	Lam Research 2300 Series and Versys Series Etch/Deposition Tools
Operating Frequency	Typical industrial frequency bands: 2 MHz, 27 MHz, 60 MHz
Voltage Measurement Range	0 – 1000 V (Peak, subject to coupler design)
Current Measurement Range	0 – 50 A (Peak, subject to coupler design)
Phase Measurement Accuracy	±0.5° to ±1.0° (Typical Value)
Output Signal Type	Multi-channel analog DC voltage output (0-10 V) for V, I, P, Φ signals
RF Connector Type	Customized 7/16 DIN or HN type (Input/Output)
Electrical Interface	Sealed multi-core aviation plug (for signal output)
Operating Temperature	0°C to 50°C (Built-in temperature compensation)
Material	High-permeability alloy housing, silver-plated internal conductors
Installation Method	Inline installation between internal RF transmission lines of equipment

Structure and Composition

853-A50744-001 is a precisely designed passive-active hybrid RF device, with a core internal structure enabling lossless sampling and accurate measurement of high-power RF signals. The module consists of three independent functional areas: RF signal coupling and voltage division area, signal conditioning and detection area, as well as power and output interface area.

In the RF signal coupling area, a precision main transmission line runs through the entire module. High-directional voltage coupling capacitive voltage dividers and current transformers (Rogowski coils or magnetic rings) are arranged adjacent to the main transmission line, extracting low-power sample signals proportional to RF voltage and current via electric field and magnetic field coupling respectively.

These sampled signals are transmitted to the signal conditioning area, which integrates high-linearity active detection circuits, precision operational amplifiers and phase comparison circuits. The system converts high-frequency V and I signals into stable DC voltage signals and calculates the phase difference between them. To guarantee consistent measurement accuracy, a precision ambient temperature compensation circuit is embedded in this area to offset the impact of temperature changes on the sensitivity of sensing components.

The entire circuit is fully encapsulated in a high-permeability metal housing, delivering excellent electromagnetic shielding performance and preventing external RF interference from compromising measurement precision. The sealed aviation plug output interface ensures reliable transmission of multi-channel analog signals (V_V, V_I, V_P, V_Φ) and achieves perfect electrical matching with the equipment control system.

Key Features and Advantages

1. Excellent Broadband Response and High Linearity

Customized for Lam Research multi-frequency RF systems, 853-A50744-001 features ultra-flat frequency response and superior amplitude linearity across core industrial frequency bands including 2 MHz, 27 MHz and 60 MHz. It delivers consistent and accurate measurement data regardless of the frequency combination adopted in different processes, ensuring the stable operation of impedance matching and power control algorithms under diverse process conditions.

2. Ultra-high Phase Measurement Accuracy and Stability

Different from ordinary directional couplers that only support power measurement, this component can precisely capture the phase angle (Φ) between RF voltage and current, a critical parameter for calculating the complex components (resistance R and reactance X) of load impedance. With a phase measurement accuracy up to ±1.0°, it provides the most fundamental and reliable data support for advanced real-time impedance matching and plasma state monitoring.

3. Superior Process Adaptability and Long-term Reliability

Manufactured in strict compliance with the stringent reliability and cleanliness standards for semiconductor equipment, the component adopts a fully enclosed metal housing, silver-plated internal conductors and corrosion-resistant RF connectors. It maintains long-term stable operation with minimal measurement drift in the complex electromagnetic environments and corrosive gas atmospheres inside semiconductor tools. It effectively reduces equipment calibration frequency and maintenance costs caused by aging sensing components.

Application Fields

853-A50744-001 is exclusively applied to plasma process equipment in the front-end manufacturing process of semiconductors. It is widely integrated into Lam Research 2300 Series etchers (including Kiyo dielectric etching and Flex conductor etching) and partial Versys Series deposition and cleaning tools, serving as a standard feedback component in RF transmission links.

The sensor provides real-time RF voltage, current and phase data for the equipment’s Automatic Matching Network (AMN) and process control algorithms. With these data, the control system can accurately calculate load impedance and drive the variable components in the matching network to realize rapid and precise impedance matching.

Signal distortion of phase or amplitude from the sensor will lead to incorrect responses of the matching network, sharp increase of reflected power, abnormal process conditions and even equipment protective shutdown. For advanced manufacturers of logic chips, memory chips and power devices that pursue strict process window control and high Overall Equipment Effectiveness (OEE), 853-A50744-001 is a core guarantee for stable production yield and reliable equipment operation.